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DC Magnetron Sputtering Coating Machine , Unbalanced Planar Sputtering Coating System

Categories Magnetron Sputtering Coating Machine
Brand Name: ROYAL
Model Number: RTSP1200
Certification: CE certification
Place of Origin: Made in China
MOQ: 1 set
Price: negotiable
Payment Terms: L/C, T/T
Supply Ability: 6 sets per month
Delivery Time: 12 weeks
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Chamber: Vertical Orientation, 2-doors
Material: Stainless Steel 304/316
Deposition Sources: DC Sputtering Cathode
Technique: PVD, Balanced/Unbalanced Magentron Sputtering Cathode
Applications: decorations of jewelry, watch, conductive film coating, metal film, electronics, fuel cell, physics energy, auto industries
Film Features: wear resistance, strong adhesion, decorative coating colors
Factory Location: Shanghai city, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine operation, maintenance, coating process Recipes, program
Warranty: Limited warranty 1 year for free, whole life for machine
OEM & ODM: available, we support tailor made design and fabrication
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    DC Magnetron Sputtering Coating Machine , Unbalanced Planar Sputtering Coating System


    DC Magnetron Sputtering Coating Machine / DC Sputtering System


    Magnetron Sputtering Models: DC Sputtering, MF Sputtering, RF Sputtering


    What is DC Sputtering?


    DC Sputtering mainly used to sputter pure metal targets like: Chrome, Titanium, Aluminum, Copper, Stainless Steel, Nickle, Silver, Gold for high conductive films.


    DC Sputtering is a Thin Film Physical Vapor Deposition (PVD) Coating technique where a target material to be used as the coating is bombarded with ionized gas molecules causing atoms to be “Sputtered” off into the plasma. These vaporized atoms are then deposited when they condense as a thin film on the substrate to be coated.


    DC Sputtering is the most basic and inexpensive type of sputtering for PVD metal deposition and electrically conductive target coating materials. Two major advantages of DC as a power source for this process is that it is easy to control and is a low cost option if you are doing metal deposition for coating.

    DC Sputtering is used extensively in the semiconductor industry creating microchip circuitry on the molecular level. It is used for gold sputter coatings of jewelry, watches and other decorative finishes, for non-reflective coatings on glass and optical components, as well as for metalized packaging plastics, car mirrors, car lighting reflectors, car wheel and hubs etc.


    DC Magnetron Sputtering Coating Machine Performance

    1. Ultimate Vacuum Pressure: better than 5.0×10-6 Torr.

    2. Operating Vacuum Pressure: 1.0×10-4 Torr.

    3. Pumpingdown Time: from 1 atm to 1.0×10-4 Torr≤ 3 minutes ( room temperature, dry, clean and empty chamber)

    4. Metalizing material (sputtering + Arc evaporation): Ni, Cu, Ag, Au, Ti, Zr, Cr, TiN, TiC, TiAlN, CrN, CrC, etc.

    5. Operating Model: Full Automatically /Semi-Auto/ Manually


    DC Magnetron Sputtering Coating Machine Structure

    The vacuum coating machine contains key completed system listed below:

    1. Vacuum Chamber

    2. Rouhging Vacuum Pumping System (Backing Pump Package)

    3. High Vacuum Pumping System ( Magnetically Suspension Molecular Pump)

    4. Electrical Control and Operation System

    5. Auxiliarry Facility System (Sub System)

    6. Deposition System: DC sputtering cathode, DC power supply, Bias Power Supply Ion source for optional


    DC Magnetron Sputtering Coating Machine Specifications

    RTSP1250-DC
    MODELRTSP1250-DC
    TECHNOLOGYMagnetron Sputtering (DC) + Ion Plating
    MATERIALStainless Steel (S304)
    CHAMBER SIZEΦ1250*H1250mm
    CHAMBER TYPECylinder, vertical, 1-door
    SPUTTERING SYSTEMExclusively design for thin black film deposition
    DEPOSITION MATERIALAluminum, Silver, Copper, Chrome, Stainless Steel, Nickel, Titanium
    DEPOSITION SOURCECylindrical / Planar Sputtering Targets + 7 Steered Cathodic Arc Sources
    GASMFC- 4 ways, Ar, N2, O2, C2H2
    CONTROLPLC(Programmable Logic Controller) +
    Touch Screen
    PUMP SYSTEMSV300B - 1 set (Leybold)
    WAU1001 - 1 sets (Leybold)
    D60T- 2sets (Leybold)
    Turbo Molecular Pumps: 2* F-400/3500
    PRE-TREATMENTBias power supply: 1*36 KW
    SAFETY SYSTEMNumerous safety interlocks to protect operators
    and equipment
    COOLINGCold Water
    POWER ELECTRICAL480V/3 phases/60HZ ( USA compliant)
    460V/3 phases/50HZ ( Asia compliant)
    380V/3 phases/50HZ ( EU-CE compliant)
    FOOTPRINTL3000*W3000*H2000mm
    TOTAL WEIGHT7.0 T
    FOOTPRINT( L*W*H) 5000*4000 *4000 MM
    CYCLE TIME30~40 minutes (depending on substrate material,
    substrate geometry and environmental conditions)
    POWER MAX..155KW
    AVERAGE POWER CONSUMPTION (APPROX.)75KW

    We have more models for your selection!


    Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


    Quality DC Magnetron Sputtering Coating Machine ,  Unbalanced Planar Sputtering Coating System for sale
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